| abstract |
The objects of the present invention are to provide photosensitive compositions and photosensitive films that may represent little surface tackiness, proper laminating ability, appropriate handling property, and superior shelf stability, and also may display superior chemical resistance, higher surface hardness, and sufficient thermal resistance after developing; in addition, to provide highly fine and precise permanent patterns such as protective layers, interlayer insulating films, and solder resist patterns and the like. These objects may be attained by the photosensitive composition that comprises (A) a copolymer, (B) a polymerizable compound, and (C) a photopolymerization initiator, wherein the copolymer (A) is synthesized from a precursor copolymer containing at least a monomer unit of maleic anhydride and a primary amine compound, by reacting one equivalent of anhydride group of the precursor copolymer with 0.1 to 1.2 equivalent of the primary amine compound; and the photosensitive film that utilizes the photosensitive composition. |