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filingDate 2005-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5727cd716b44c55b449e4f55d1c9dc31
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publicationDate 2005-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2005091074-A1
titleOfInvention Positively radiation-sensitive resin composition
abstract A production process by which thick deposits, such as bumps or wirings, can be formed by plating with satisfactory precision; a positively radiation-sensitive resin composition which is suitable for use in the production process and is excellent in sensitivity, resolution, etc.; and a transfer film comprising the composition. The positively radiation-sensitive resin composition comprises (A) a polymer having structural units (a) represented by the following general formula (1) and/or (2) and an acid-dissociable functional group (b), (B) an ingredient which generates an acid upon irradiation with a radiation, and (C) an organic solvent. A positively radiation-sensitive resin film comprising the composition can also be produced.
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