http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013072124-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D5-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D5-02 |
| filingDate | 2011-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_108d1bb75db5370aede685b3152590f3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_55ee5dbb707da45e0d92e2bb8d709ade http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2b8ae3c1ab18ff4981e356e048292328 |
| publicationDate | 2013-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2013072124-A |
| titleOfInvention | Plating method and surface modifier |
| abstract | A plating method for forming a plating film is provided. A step of forming a resist pattern on a substrate includes a structural unit represented by the following general formula (1) and a polymer having a structural unit represented by the following general formula (2) on the resist pattern forming surface. A plating method comprising a step of forming a surface modification layer and a step of forming a plating film in an opening of a resist pattern. [Wherein R 1 is a hydrogen atom or a methyl group, R 2 is a single bond or a divalent linking group, R 3 is a hydrogen atom, a hydroxyl group or an alkoxy group, R 4 is a hydrogen atom or a methyl group, and R 5 is a polar group. Indicates. ] [Selection figure] None |
| priorityDate | 2011-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 66.