| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cd62aff5d23b7033fc92db26e8bf97ca
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b966ee11f5362e1aabd8c443c7a151b0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_748abc7165750444ffc532836ab28e45
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c04d5a3885e23c4cbe81c1ea3f2e5dec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-0838
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-1804 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate |
2004-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_670658efa05c6b03e0e75c02bc4d8d76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86f91a4508fd454abfd66a39ab282bf4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9502c1868d49c46ae4ec1d98ef563bb4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_495b55b56a8232e1307e0814ab8ed6dd |
| publicationDate |
2005-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2005037846-A1 |
| titleOfInvention |
Silane compound, polysiloxane and radiation-sensitive resin composition |
| abstract |
Disclosed is a novel polysiloxane which is suitable for a resin component in a chemically amplified resist that is particularly excellent in I-D bias, depth of focus (DOF) and the like. Also disclosed are a novel silane compound useful as a raw material for synthesizing such a polysiloxane, and a radiation-sensitive resin composition containing such a polysiloxane. The silane compound is represented by the following formula (I). (I) The polysiloxane has a constitutional unit represented by the following formula (1). (1) (R represents an alkyl group; R1 and R2 respectively represent a fluorine atom, a lower alkyl group or a lower fluorinated alkyl group; n is 0 or 1; k is 1 or 2; and i is an integer of 0-10.) The radiation-sensitive resin composition contains such a polysiloxane and a radiation-sensitive acid generator. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007070337-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4687898-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007246596-A |
| priorityDate |
2003-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |