| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c015cd927ac743a5b7bd47eeb61b90f7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d63db8f294f80893823389891097e06a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_74da95b44bd71fcea5f926c3c5c0c07c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_614fc6141d5522b2197369cd652d7586 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-8422
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B11-0683
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B11-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1651
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1667
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1675
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-9501 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01B11-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01J3-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-95 |
| filingDate |
2004-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59bddbd3e17949f2bf24a6eddf49816f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_950ff73716320522c4cf39ce73a366a6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d85c085c4fb9e00bceb8e81c8c4dfe49
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0bf69e3bb0642827d5adc8136f2b9224 |
| publicationDate |
2005-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2005028705-A1 |
| titleOfInvention |
Apparatus and method of detecting the electroless deposition endpoint |
| abstract |
An apparatus and a method of controlling an electroless deposition process by directing electromagnetic radiation towards the surface of a substrate and detecting the change in intensity of the electromagnetic radiation at one or more wavelengths reflected off features on the surface of the substrate. In one embodiment the detected end of an electroless deposition process step is measured while the substrate is moved relative to the detection mechanism. In another embodiment multiple detection points are used to monitor the state of the deposition process across the surface of the substrate. In one embodiment the detection mechanism is immersed in the electroless deposition fluid on the substrate. In one embodiment a controller is used to monitor, store, and/or control the electroless deposition process by use of stored process values, comparison of data collected at different times, and various calculated time dependent data. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9658168-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010127843-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022015999-A1 |
| priorityDate |
2003-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |