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filingDate 2003-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2004-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2004061155-A1
titleOfInvention High rate deposition of titanium dioxide
abstract There is provided a structure. The structure comprises a substrate (12), and a titanium oxide layer (14) disposed over the substrate (12). There is also provided a method of forming a titanium oxide coating (14) on a substrate (12). The method includes generating a plasma; providing a first reactant, comprising titanium, and a second reactant, comprising oxygen, into the plasma stream extending to the substrate (12); and forming the titanium oxide coating (14) on the substrate (12).
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