| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4481
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02T50-60 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-0272
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J35-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01G23-07 |
| filingDate |
2004-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2007-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2007516343-A |
| titleOfInvention |
Method of depositing titanium oxide using a plasma source |
| abstract |
The present invention relates to a method for depositing a titanium oxide coating film on a substrate, wherein the coating film having photochemical properties, in particular, contains at least one organometallic precursor and / or metal halide of the metal oxide. It relates to a process characterized in that it is chemically deposited in the gas phase from a gas mixture comprising and this deposition is assisted by a plasma source. |
| priorityDate |
2003-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |