| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2428d1fd54ddec8dbe860413937d0a05
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a040da10f5e860459bee61c529e0d40e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3fb32acb4346e3b944b4f30d529308db
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0b195de217337ed36a43935d48ef8fb5 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01Q7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3299
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01Q21-29
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01Q7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01Q11-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01Q1-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01Q21-29 |
| filingDate |
2003-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b506c793ceec2472c3c172c12dc1a766
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aea604f0a609601b3c298126a349ae98
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_84b2ac0cd499234e96c17833f0d8bb04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b17e3c40288e451720c64101eb7d733 |
| publicationDate |
2004-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2004010457-A1 |
| titleOfInvention |
Method and apparatus for producing uniform processing rates |
| abstract |
An antenna arrangement for generating an rf field distribution at a plasma generating region inside a chamber wall of a process chamber of a plasma processing apparatus is described. The antenna arrangement includes an rf inductive antenna to which an rf power supply can be connected to supply an rf current to generate a first rf field extending into the plasma generating region. A passive antenna is also provided which is inductively coupled to the rf inductive antenna and configured to generate a second rf field modifying the first rf field. The rf field distribution at the plasma generating region increases the processing uniformity of the processing apparatus compared to that in the absence of the passive antenna. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103907403-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10297457-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105719928-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9293299-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10020167-B2 |
| priorityDate |
2002-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |