| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9d91b2f9432de1bcf3290473f7a3e96c |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 |
| filingDate |
2003-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f251d5e74ea3d47d8324f3fb61a1e5bb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d98777b21cc5990944e3ffc139eca3f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ccd8580a80796c64955d1ca045c591b1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d21940109cf2aab6f2fe8663cae1e3a2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb91845e35c4e40f64ede2b28e2210a1 |
| publicationDate |
2004-01-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2004002955-A2 |
| titleOfInvention |
Photosensitive compositions |
| abstract |
Radiation sensitive compositions for use in producing a patterned image on a substrate comprising: e) a first photoacid generator (PAG) compound P1, which comprises one or more compounds of the structure (A); f) a second photoacid generator compound P2 which comprises one or more compounds of the structure (B); and g) a polymer component comprising an alkali soluble resin component whose alkali solubility is suppressed by the presence of acid sensitive moieties and whose alkali solubility is returned by treatment with an acid and, optionally, heat; wherein said polymer comprises one or more polymers comprising the monomer unit (C); and h) a solvent. All formula structures are defined in the specification. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8148443-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101029952-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101334046-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007087949-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1791024-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1791024-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10509315-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7842804-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11550217-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014026260-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009501148-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007119467-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7892722-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7736842-B2 |
| priorityDate |
2002-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |