http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0223611-A3
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-76 |
filingDate | 2001-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb31cc8fb92946bfd4dc0ec2bc387747 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7afe501edae5cb19ed01f02a761b6186 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd49b7b4c89da8f4f293cf0ef73df47c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea0f275e5b1082ebdf727280b8e7c2e4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_204dbb1bfc97ba08e96b036a1ed7f2f1 |
publicationDate | 2002-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | WO-0223611-A3 |
titleOfInvention | Integration of silicon etch and chamber cleaning processes |
abstract | A method for processing a substrate disposed in a substrate process chamber having a source power includes transferring the substrate into the substrate process chamber. A trench is etched on the substrate by exposing the substrate to a plasma formed from a first etchant gas by applying RF energy from the source power system and biasing the plasma toward the substrate. Byproducts adhering to inner surfaces of the substrate process chamber are removed by igniting a plasma formed from a second etchant gas including a halogen source in the substrate process chamber without applying bias power or applying minimal bias power. Thereafter, the substrate is removed from the chamber. At least 100 more substrates are processed with the etching-a-trench step and removing-etch-byproducts step before performing a dry clean or wet clean operation on the chamber. |
priorityDate | 2000-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 23.