| abstract |
A plasma treatment device and a plasma treatment method capable of preventing an inconvenience from being produced by diagonal field immediately after the ignition of plasma while utilizing inductively coupled plasma and capable of surely igniting plasma while removing the diagonal field by using a Faraday shield in an inductively coupled plasma system; the plasma treatment device, comprising a chamber (31), a bell-jar (32), a coil (42) installed on the outside of the bell-jar (32), the Faraday shield (44) installed between the bell-jar (32) and the coil (42), a susceptor (33), an inductive member (49) installed on the upper surface of the bell-jar (32), a first high frequency power supply (43) for forming an induction field in the coil (42), and a second high frequency power supply (34) for forming a field between the susceptor (33) and the inductive member (49). |