http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-02059953-A1

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filingDate 2001-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_55a557ed8d7492ceca58383905334560
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publicationDate 2002-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-02059953-A1
titleOfInvention Conductor treating single-wafer type treating device and method for semi-conductor treating
abstract A single-wafer type treating device (20) has a mounting table (40) disposed in a treating room (24) housing a substrate to be treated (W). The mounting table (40) has a heat conductive mounting surface (41) to mount the substrate (W) thereon. Flow passages (50) that allow a heating medium for regulating the temperature of the substrate (W) via the mounting surface (41) to flow are formed in the mounting table (40). A heating medium supply unit (54) for selectively supplying a cooling medium and a heating_medium is connected to the flow passages (50).
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