http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0127988-A1

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c99e17e4da077d1a60466cf1f6d19764
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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02046
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
filingDate 2000-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_63e6d0173948df6ce22082d357507c89
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publicationDate 2001-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-0127988-A1
titleOfInvention Processing method
abstract A processing method which comprises washing an organic material and particles adhered to an article to be processed with SC-1 solution, activating a mixture of N2 gas and H2 gas by a plasma to form an active gas species, introducing NF3 gas downstream from the active gas species to thereby activate the NF3 gas, exposing the surface of the article to be processed to the resultant active gas species of NF3 gas to react the active gas species with a film formed by natural oxidation on the article and form a formed film, and heating the article to a predetermined temperature to thereby vaporize the formed film. The method can be employed for reducing the contact resistance defined in the specification even in a fine hole or a narrow portion, while maintaining a good state after processing.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8398813-B2
priorityDate 1999-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 23.