| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36454c365151edb772e58e9e6dc771ae |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09C2220-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09C2210-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09C2210-40 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09C1-0018
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09C1-0015
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09C1-0024
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09C1-64
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09C3-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0005 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09C3-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09C1-64
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09C1-00 |
| filingDate |
2000-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_df153a4ab3c8c59c78ea898f5226f7ad |
| publicationDate |
2001-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-0125500-A1 |
| titleOfInvention |
Method and device for production of plane-parallel wafers |
| abstract |
The invention relates to a device for the production of plane-parallel wafers which comprises a support which is rotatable about one axis, an arrangement for coating a flat surface area of the support with at least one layer of product, an arrangement for detaching the product layer from said flat surface area of the support in such a manner as to create plane-parallel wafers. Transport of said flat surface area between said coating arrangement and said detaching arrangement is achieved by rotation of the support. The arrangement for coating the support can also have a layer of release agent applied before the layer of product, said release agent being dissolved in the detaching arrangement to release the plane-parallel wafers. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007020448-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7223472-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03068868-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100948245-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7256425-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-02094945-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-1302074-C
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7157116-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8016909-B2 |
| priorityDate |
1999-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |