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filingDate 1999-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c95f60ddfe17d43e29f70c6aa994058a
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publicationDate 2000-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-0019185-A1
titleOfInvention Method for the photometric analysis of test elements
abstract The invention relates to a method for photometrically analysing test elements with a detection zone. Said method is stable in relation to positioning tolerances of the detection zone and comprises the following steps: activating a first light source in order to irradiate a first area of the detection zone and detecting the light reflected by the detection zone or transmitted through the detection zone in order to generate a first detection signal (50); activating a second light source in order to irradiate a second area of the detection zone which is offset from the first area in the direction of the position tolerance and detecting the light reflected by the detection zone or transmitted through the detection zone in order to generate a second detection signal (60); comparing the first and second detection signals and determining whether the first and/or second detection signal was/were obtained by illuminating an area situated completely in the detection zone. The invention also relates to a device for carrying out this method and to a method for the photometric analysis of a test element with identification of a an application of the sample.
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Total number of triples: 82.