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publicationDate 2018-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-9953873-B2
titleOfInvention Methods of modulating the morphology of epitaxial semiconductor material
abstract Chip structures and fabrication methods for forming such chip structures. A first device structure has a structural feature comprised of a first dielectric material and a second device structure has a structural feature comprised of a second dielectric material. A semiconductor layer has a first section adjacent to the structural feature of the first device structure and a second section adjacent to the structural feature of the second device structure. The first section of the semiconductor layer has a popped relationship relative to the structural feature comprised of the first dielectric material. The second section of the semiconductor layer includes a portion that has a pinned relationship relative to a portion of the structural feature comprised of the second dielectric material.
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