http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9911621-B2

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filingDate 2015-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2018-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ac3e98539a33f08c4f7a03a128f35da2
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publicationDate 2018-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-9911621-B2
titleOfInvention Method for processing target object
abstract This method for processing a target object includes steps ST 1 to ST 4 . The target object has an organic polymer layer and a resist mask on a substrate. In step ST 1 , the target object is electrostatically attached to an electrostatic chuck in a plasma processing apparatus. In step ST 2 , the organic polymer layer is etched through the resist mask by means of a plasma of a first gas. In step ST 3 , the target object is detached from the electrostatic chuck while a plasma of a second gas is generated. In step 4 , the resist mask is peeled off. The second gas is either oxygen gas or a mixture of oxygen gas and a rare gas having an atomic weight lower than that of argon gas.
priorityDate 2014-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 39.