| abstract |
A quantum semiconductor device is provided. The quantum semiconductor device includes a quantum heterostructure, a dielectric layer, and an electrode. The quantum heterostructure includes a quantum well layer that includes a first 2DEG region, a second 2DEG region, and a third 2DEG region. A first tunnel barrier exists between the first 2DEG region and the second 2DEG region. A second tunnel barrier exists between the second 2DEG region and the third 2DEG region. A third tunnel barrier exists either between the first 2DEG region and the third 2DEG region. The dielectric layer is formed on the quantum heterostructure. The electrode is formed on the dielectric layer directly above the first tunnel barrier. |