http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9802826-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d794b4904270a2f081a93438a2d2d076 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-1203 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0883 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0894 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0871 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-64 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0869 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-021 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-088 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-021 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-08 |
| filingDate | 2013-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_195fdecd353143a3194858b2e41e4e21 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e296e2ec287c947ba64e399f237f1e07 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8b04eca6bc6680137535f712a20decc6 |
| publicationDate | 2017-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-9802826-B2 |
| titleOfInvention | Apparatus for producing silicon nanoparticle using inductive coupled plasma |
| abstract | An apparatus for producing silicon nanoparticles using ICP includes a gas supply part in which first and second pipes for introducing a respective first and second gas into the plasma reactor therethrough are arranged alternately, the first pipes extending from an inlet of the reactor to a plasma initiation region; a plasma reaction part having an ICP coil wound therearound in which the particles are formed as the gases introduced through the respective pipes undergo a plasma reaction; and a collection part for collecting the particles. The apparatus can fully mix the gases introduced through the first gas supply pipes, thus allowing for uniform plasma reaction between the first and second gas, minimizing plasma expansion to increase plasma density within short retention time, easily controlling the size distribution by quenching and capturing nanoparticles, and improving the production yield by preventing the secondary aggregation of particles with cooling gas. |
| priorityDate | 2013-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 35.