| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dfbd7b61ec48d5942554e5acbea19115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_136ba68ea9174170e8362b68e294ac52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a30ab3a389fcab88bddd13c33c4e763b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_99e0ccc0bcbf8bb7907529488f4267d4 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2010-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_512fbf1c09275064cbb6c2d30cf92a3c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5823aa381af289bdd4bb52b4a2cd1e15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_325280d41f0349e485f52c2d981016dd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8c25ff7971e98fc514f84cb516d908f |
| publicationDate |
2017-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9726976-B2 |
| titleOfInvention |
Photoresist composition |
| abstract |
A photoresist composition comprising an acid generator and a resin comprising a structural unit derived from a monomer represented by the formula (1): n n n n n n n n n n n n wherein R 1 represents a hydrogen atom etc., n R 2 represents a hydrogen atom or a C1-C4 alkyl group, n A 1 represents a single bond etc., and n B 1 represents n a group represented by the formula (1a): n n n n n n n n n n n n n n n n wherein R 3 , R 4 and R 5 each independently represents a C1-C16 aliphatic hydrocarbon group and R 4 and R 5 can be bonded each other to form a C3-C18 ring together with the carbon atom to which R 4 and R 5 are bonded, n a C4-C20 saturated cyclic group having a lactone structure or n a C5-C20 saturated cyclic hydrocarbon group having at least one hydroxyl group. |
| priorityDate |
2009-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |