| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0cc90a4cda4760c9a104d5acb5af3019 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0332 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-331 |
| filingDate |
2016-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a494ba6a92141c34ae21f0d08ded11ca |
| publicationDate |
2017-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9679771-B1 |
| titleOfInvention |
Fabrication and design methods using selective etching and dual-material self-aligned multiple patterning processes to reduce the cut-hole patterning yield loss |
| abstract |
Design and fabrication methods to reduce the effect of edge-placement errors in the cut-hole patterning process are invented using selective etching and dual-material self-aligned multiple patterning processes. The invented methods consist of a series of processing steps to decompose the original cut-hole mask into multiple separate masks, pattern the cut holes on the resist to expose certain targeted lines, and selectively etch the exposed targeted lines (formed by dual-material self-aligned multiple patterning processes) without attacking the non-target lines. This invention provides production-worthy methods for the semiconductor industry to continue IC scaling down to sub-10 nm half pitch. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111564369-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111564369-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9991131-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10991584-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11437239-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2020066523-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11127627-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11201056-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10971363-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10943816-B2 |
| priorityDate |
2016-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |