| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-485 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53266
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53295
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5329
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53223
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53238
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31127
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5222
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-088
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-7682
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76834
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823468
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823475
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02181
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76897
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76885
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76883
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-528
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823418
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5226 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-528
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-522 |
| filingDate |
2016-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_74bb981ea1d08731e68abe871800725c |
| publicationDate |
2017-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9653347-B1 |
| titleOfInvention |
Vertical air gap subtractive etch back end metal |
| abstract |
After forming source/drain contact structures within an interlevel dielectric (ILD) layer to contact source/drain regions of a field effect transistor (FET), the ILD layer is recessed to expose upper portions of the source/drain contact structures. A sacrificial layer is then formed on a remaining portion of the ILD layer to laterally surround the upper portions of the source/drain contact structures. An interconnect conductor portion is subsequently formed to contact the source/drain contact structures by subtractive patterning of a metal layer that is formed on the sacrificial layer. Next, the sacrificial layer is removed, leaving a void between the interconnect conductor portion and the remaining portion of the ILD layer. A interconnect liner layer is then formed on a top surface and sidewalls of the interconnect conductor portion and on the remaining portion of the ILD layer. The interconnect liner layer encloses an air gap surrounding the upper portions of the source/drain contact structures. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110176453-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11276767-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11545587-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10546855-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11289368-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11581452-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10319680-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018090492-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10276671-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018269305-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022059665-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022102201-A1 |
| priorityDate |
2016-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |