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publicationDate 2017-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-9653310-B1
titleOfInvention Methods for selective etching of a silicon material
abstract The present disclosure provides methods for etching features in a silicon material includes performing a remote plasma process formed from an etching gas mixture including chlorine containing gas to remove a silicon material disposed on a substrate.
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