| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2aef2d0718520f0ce189c4982a77eb74 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67155
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05B2219-34198
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-24585
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-248
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-24564
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67011
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-12 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32816
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32917
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32926
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30655
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05B19-418
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67196
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32834
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00349
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G05B19-418
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate |
2013-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c24c9b7c2435538e74553ec074f09b65
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7837f75640e09c1cef8693dbd32074c5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_55b37f980daa738e9799d7ce749970f0 |
| publicationDate |
2016-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9412566-B2 |
| titleOfInvention |
Methods and apparatus for depositing and/or etching material on a substrate |
| abstract |
Methods are disclosed for depositing material onto and/or etching material from a substrate in a surface processing tool having a processing chamber, a controller and one or more devices for adjusting the process parameters within the chamber. The method comprises: the controller instructing the one or more devices according to a series of control steps, each control step specifying a defined set of process parameters that the one or more devices are instructed to implement, wherein at least one of the control steps comprises the controller instructing the one or more devices to implement a defined set of constant process parameters for the duration of the step, including at least a chamber pressure and gas flow rate through the chamber, which duration is less than the corresponding gas residence time (T gr ) of the processing chamber for the step. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2020048080-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019139746-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016203996-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11664206-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10947110-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10754254-B1 |
| priorityDate |
2012-02-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |