abstract |
A polymer includes repeat units having the structure n nwherein R 1 , R 2 , Ar 1 , Ar 2 , and Ar 3 are defined herein. The polymer can be prepared by Suzuki polycondensation. The acetal and/or ketal functionality in the polymer backbone make the backbone-cleavable in acid. The polymer is useful in applications including lithographic photoresists. |