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filingDate 2015-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2016-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2016-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-9397180-B1
titleOfInvention Low resistance sinker contact
abstract An semiconductor device with a low resistance sinker contact wherein the low resistance sinker contact is etched through a first doped layer and is etched into a second doped layer and wherein the first doped layer overlies the second doped layer and wherein the second doped layer is more heavily doped that the first doped layer and wherein the low resistance sinker contact is filled with a metallic material. A method for forming a semiconductor device with a low resistance sinker contact wherein the low resistance sinker contact is etched through a first doped layer and is etched into a second doped layer and wherein the first doped layer overlies the second doped layer and wherein the second doped layer is more heavily doped that the first doped layer and wherein the low resistance sinker contact is filled with a metallic material.
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