http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9376764-B2

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filingDate 2013-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2016-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3f2cc913a7f2578d05b8542785baa88
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publicationDate 2016-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-9376764-B2
titleOfInvention Physical vapor transport growth system for simultaneously growing more than one SiC single crystal and method of growing
abstract The present invention relates to a configuration and in particular a physical vapor transport growth system for simultaneously growing more than one silicon carbide (SiC) bulk crystal. Furthermore, the invention relates to a method for producing such a bulk SiC crystal. A physical vapor transport growth system for simultaneously growing more than one SiC single crystal boule comprises a crucible containing two growth compartments for arranging at least one SiC seed crystal in each of them, and a source material compartment for containing a SiC source material, wherein said source material compartment is arranged symmetrically between said growth compartments and is separated from each of the growth compartments by a gas permeable porous membrane.
priorityDate 2012-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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