| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0fa3ca2c9e92a92d9079a47a3d42b12e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4e63466f59fcf2899f8baceac577a734
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2803ed951af0ab869e71420a7076ed49 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K2103-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K2203-56 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-0006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-0738
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-0853
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-0081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-354
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-034
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-268
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-0622
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-127
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28035
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-0608 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K26-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K26-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K26-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F27D11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K26-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K26-073
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K26-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K26-03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-268
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 |
| filingDate |
2012-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_562a5dcae8e5085c64e972ab1588b395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a2a28ae081cc8e3fc1d0cfb9403fb35f |
| publicationDate |
2016-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9302348-B2 |
| titleOfInvention |
Ultrafast laser annealing with reduced pattern density effects in integrated circuit fabrication |
| abstract |
Systems and methods for performing ultrafast laser annealing in a manner that reduces pattern density effects in integrated circuit manufacturing are disclosed. The method includes scanning at least one first laser beam over the patterned surface of a substrate. The at least one first laser beam is configured to heat the patterned surface to a non-melt temperature T nonmelt that is within about 400° C. of the melt temperature T melt . The method also includes scanning at least one second laser beam over the patterned surface and relative to the first laser beam. The at least one second laser beam is pulsed and is configured to heat the patterned surface from the non-melt temperature provided by the at least one first laser beam up to the melt temperature. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/RU-2685427-C1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/RU-2691923-C1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3726564-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11355344-B2 |
| priorityDate |
2011-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |