| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D179-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G12-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-0627
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G16-0275
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D161-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3088 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G12-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D161-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G16-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D179-04 |
| filingDate |
2013-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a2cf3f9243b10468d4363d9faa4776a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_31c3da48141cf33839cfbc6b5598dbc1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ccd40bc3530c30e0cb023b3a760a6e30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d338fa9da212910df6f0916095817b8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b12a60fc01802a82206c0e866c00e3b6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88aa49faad4cf70318f887946d799b49 |
| publicationDate |
2016-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9261790-B2 |
| titleOfInvention |
Resist underlayer film-forming composition containing copolymer resin having heterocyclic ring |
| abstract |
A resist underlayer film-forming composition for forming a resist underlayer film having both dry etching resistance and heat resistance. A resist underlayer film-forming composition comprising a polymer containing a unit structure of Formula (1): n nIn Formula (1), R 3 is a hydrogen atom, and both n1 and n2 are 0. A method for producing a semiconductor device comprising the steps of: forming an underlayer film on a semiconductor substrate using the resist underlayer film-forming composition; forming a hard mask on the underlayer film; further forming a resist film on the hard mask; forming a resist pattern by irradiation with light or electron beams and development; etching the hard mask using the resist pattern; etching the underlayer film using the hard mask patterned; and fabricating the semiconductor substrate using the patterned underlayer film. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11215928-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9809672-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9540476-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015166711-A1 |
| priorityDate |
2012-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |