| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_890469738c637f0d32ca777850705ed1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e0819771120ab1f51ab3c913454f8ced
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eb08f5c189541d9f36c8e106717157b3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b78c03e0f84aba761fff82f9174c1cbe |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2201-0323
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24479
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-061 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76825
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41N1-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate |
2012-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6846b9c32500dd8f8521cd8cb07e584d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9164106cb468251b71a171413daae3e7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4e3392873c2c17b082fde964f1185975 |
| publicationDate |
2015-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9188873-B2 |
| titleOfInvention |
Substrate having etching mask and method for producing same |
| abstract |
Provided are a substrate with an etching mask which enables high definition patterning and a method of manufacturing the same. A photosensitive material is applied on a surface of a substrate, exposure and development of the photosensitive material are carried out to form a resist pattern, a DLC coating film is formed on the surface of the substrate and a surface of the resist pattern, and the DLC coating film formed on the resist pattern is separated together with the resist pattern to form a DLC pattern on the surface of the substrate. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11124008-B2 |
| priorityDate |
2011-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |