| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed62b7551998e54b35784cdbbb2778d5 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02219
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4408
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32862
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45542
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32834 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-00 |
| filingDate |
2014-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c8a94dabf73c9dc415fc3d4da20086a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_63ce60c47becdcc7b111964b81809db3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e95b68f5440937dfe4a8e6cc32fafacc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9200fb32fc5be9c474d0937a85728589
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a8b6eb1f8c6704031b88eaff4340271d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d9335dddcc045ce87c1ad594a11aa0c7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5f015efef6233fdfb706e057af090ca8 |
| publicationDate |
2015-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9163309-B2 |
| titleOfInvention |
Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium |
| abstract |
Generation of byproducts is inhibited in a buffer space even in a single-wafer-type apparatus using the buffer space. A method of manufacturing a semiconductor device includes (a) loading a substrate into a process chamber; (b) supplying a first-element-containing gas via a buffer chamber of a shower head to the substrate placed in the process chamber; (c) supplying a second-element-containing gas to the substrate via the buffer chamber; and (d) performing an exhaust process between (b) and (c), wherein (d) includes: exhausting an atmosphere of the buffer chamber; and exhausting an atmosphere of the process chamber after exhausting the atmosphere of the buffer chamber. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015270119-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9340879-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9659767-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015214044-A1 |
| priorityDate |
2013-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |