Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_294881271413951a95f284b588a68e66 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-13091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-10253 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-3025 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14685 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-02166 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-48463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-48453 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14627 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14621 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-01021 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14683 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14687 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76841 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-146 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
filingDate |
2014-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2015-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_15e86f71b7dc64aed7300353d5cb907a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_096810d89ad6f895b13a095a359b7092 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_67b3f9119b2703fc74b1051764b3effe http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30050672ba633a6f53cc985196902d24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_34d75607b7f01ab4a2d3dee948565ea7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a9428abe45639f778238b198c0081ee |
publicationDate |
2015-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-9099534-B2 |
titleOfInvention |
Manufacturing method of semiconductor device, semiconductor device and electronic apparatus |
abstract |
A manufacturing method of a semiconductor device includes exposing a wiring layer which is formed of an alloy including two or more types of metals having different standard electrode potentials, on one surface side of a semiconductor substrate and performing a plasma process of allowing plasma generated by a mixture gas of a gas including nitrogen and an inert gas or plasma generated by a gas including nitrogen to irradiate a range which includes an exposed surface of the wiring layer. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10770384-B2 |
priorityDate |
2011-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |