| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1eb9cd2af2f87dcf20b0fbbdfe79996e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b648ca00e3078ca906e618cb7641df9a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_234f3f3efa0867fc3bd778ad90bfbea1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ac78218d10bb24832e085df7659e67e8 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02345
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45523
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05C1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02337
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0234
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02107
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05C11-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05C11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05C1-00 |
| filingDate |
2012-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7144e116ffff717a59d4aff4a8581c6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60865e3859f938394cef2234a4f8689b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_81d50f8459433f95dbcdc9290655dae7 |
| publicationDate |
2015-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9064684-B1 |
| titleOfInvention |
Flowable oxide deposition using rapid delivery of process gases |
| abstract |
Methods and apparatus for filling gaps on partially manufactured semiconductor substrates with dielectric material are provided. In certain embodiments, the methods include introducing a first process gas into the processing chamber and accumulating a second process gas in an accumulator maintained at a pressure level substantially highest than that of the processing chamber pressure level. The second process gas is then rapidly introduced from the accumulator into the processing chamber. An excess amount of the second process gas may be provided in the processing chamber during the introduction of the second process gas. Flowable silicon-containing films forms on a surface of the substrate to at least partially fill the gaps. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9916977-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9257302-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9245739-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020028065-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9847222-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022025970-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015118862-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10049921-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10388546-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11270896-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9719169-B2 |
| priorityDate |
2009-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |