| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-208 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-208
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate |
2014-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d7ae0cc30c24ecf88ff988622093d7f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9eb1152445efaaff8c57573390ed3a95
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f19b611fef8c830266c1089c37fcf7a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eac6132ed7e5d2d83dbbdcd1310d7154 |
| publicationDate |
2014-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8895226-B2 |
| titleOfInvention |
Coating composition for DUV filtering, method of forming photoresist pattern using the same and method of fabricating semiconductor device by using the method |
| abstract |
Provided are a coating composition for deep ultraviolet (DUV) filtering during an extreme ultraviolet (EUV) exposure, the coating composition including about 100 parts by weight of a solvent including a first solvent (the first solvent being an alcoholic solvent); and about 0.05 parts by weight to about 5 parts by weight of a coating polymer having a degree of absorption of about 50%/μm or greater with respect to 193-nm incident light. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10353290-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015168839-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9791788-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10663864-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016268176-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9383647-B2 |
| priorityDate |
2010-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |