Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_00f1e7969c1dfa72f996bfbdab66e462 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1d29f7ac2c7f9be9f7dae1a83bbb5c92 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bb4d8781049b1f6a4f5fbd58768451a9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7204e93ebfd9740918cca60cb287fc63 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_355594f93afa6952cf6e0eb813499aa4 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
filingDate |
2006-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2014-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b47758bd0825e679d6647767d04fcb4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f00ba9f3f4666fd50d64744bc5c5557b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_238ee1de42842bef6c465f3cab866fa2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_20e3b6be2c1278b7dd7c70e6cc8fbcbe |
publicationDate |
2014-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-8808976-B2 |
titleOfInvention |
Photoresist developer and method for fabricating substrate by using the developer thereof |
abstract |
A photoresist developer including a basic aqueous solution containing 0.5˜10 mass % of a particular nonionic surfactant and 0.01-10 mass % of particular ammonium compound, the photoresist developer makes it possible to form a favorable resist pattern with out causing scum even when developing thick photoresists. |
priorityDate |
2005-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |