| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_88d7587e5acee6b60ed1c0358cde6a9f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A44D2200-10 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A44B11-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2006-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ba4a72d7f20c66de0b4be6bfc5029587 |
| publicationDate |
2014-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8741537-B2 |
| titleOfInvention |
Positive resist composition and pattern-forming method using the same |
| abstract |
A positive resist composition, which comprises a resin having a structure showing a basicity and capable of increasing the solubility in an alkali developer by the action of an acid, and a pattern-forming method using the same. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013344439-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10719014-B2 |
| priorityDate |
2005-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |