Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dfcf6131edcce048a40106c297260b21 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1543b2b19ec0e331a0dcd89888cbef5f http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e4d64f09b2b6204186ee69da5a76b583 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31507 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-46 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
filingDate |
2012-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2014-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_410840705e4ff9c9ed2224eef663d1af http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e661a29c3a3bfc9405c4944ac5cfeb96 |
publicationDate |
2014-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-8703385-B2 |
titleOfInvention |
Photoresist composition |
abstract |
A low surface energy photoresist composition is described that comprises a silicone-polyether block copolymer, wherein the silicone block comprises 35 wt. % or more of said copolymer. When compounded with a photoresist composition, the composition enables the release of a phototool from the photoresist layer. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9176383-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9217920-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015126005-A1 |
priorityDate |
2012-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |