| abstract |
An object of the invention is to provide efficient, simple and inexpensive processes for the production of carbonyl difluoride, which is an attractive and important compound as a semiconductor etching gas or a semiconductor cleaning gas. A process for producing carbonyl difluoride of the invention includes a step of reacting phosgene and hydrogen fluoride in a gas phase in the presence of a fluorination catalyst to produce carbonyl difluoride and hydrogen chloride, and a step of mixing a mixture containing the carbonyl difluoride and the hydrogen chloride with an organic solvent that is azeotropic with hydrogen chloride but zeotropic with carbonyl difluoride, and distilling the resultant mixture to separate the carbonyl difluoride. |