Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_84301fb11fb31d7f1f660d806a443389 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_015b6bf758999a4b37ca481543d6ef56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1e548f9ea5a33ea341372a264b2b3713 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2af35ea2547cca82d909be6ec2b9c3c1 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-16 |
filingDate |
2010-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2013-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ef39ed95da6928d4a8f71e56ad59935 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_21806ff26016364ca7842f2f969b966c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_12b46169290df680c391e27889e45bdc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_85d1c9272e8b93d88f5045c20d21a0e6 |
publicationDate |
2013-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-8603724-B2 |
titleOfInvention |
Negative resist composition and patterning process |
abstract |
There is disclosed a negative resist composition comprising at least: (A) a base polymer that is alkaline-soluble and is made alkaline-insoluble by action of an acid; (B) an acid generator; and (C) a basic component, wherein the base polymer at least contains a polymer including repeating units represented by the following general formula (1) and general formula (2) and having a weight average molecular weight of 1,000 to 10,000. There can be a negative resist composition hardly causing a bridge in forming a pattern and providing a high resolution and a patterning process using the same. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8828645-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9400430-B2 |
priorityDate |
2009-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |