| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_77f25684c7f9ecfee85dabf9c579fe77
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1f49306005173cee08acb384f145b5c8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_72d16de64051d2736d5f851583817aef
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2bf50bba8708d5c51b429d8b52d35078 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B43-27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-11551
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B41-27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30621
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B69-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B41-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32135 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-0207
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32816
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30621
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B43-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32135
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B41-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32137
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-461
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 |
| filingDate |
2011-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60df893376f804a4bff582a834ee3e70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c924e36704b31f11408724c5a600a4a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_76fcbd871684b2b2c3598301b6b2fc46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee668b4b86d0af1a43c39c5e8a60e37e |
| publicationDate |
2013-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8598040-B2 |
| titleOfInvention |
ETCH process for 3D flash structures |
| abstract |
A method for etching features in a plurality of silicon based bilayers forming a stack on a wafer in a plasma processing chamber is provided. A main etch gas is flowed into the plasma processing chamber. The main etch gas is formed into a plasma, while providing a first pressure. A wafer temperature of less than 20° C. is maintained. The pressure is ramped to a second pressure less than the first pressure as the plasma etches through a plurality of the plurality of silicon based bilayers. The flow of the main etch gas is stopped after a first plurality of the plurality of bilayers is etched. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021030310-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11482425-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11646207-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015235862-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9337056-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10692729-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017372916-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9613979-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9847266-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I759340-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9997366-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11702751-B2 |
| priorityDate |
2011-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |