| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6f76bae7fa1dda17ee603128985fe3d8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2fadcae3196ca725b795713aa49cd9f1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c99c69cb683e2714540daa9fd804048b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_881c59ae86141bd7236f7d8f7bebb55a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c441aebc2de23a70fdadb990aae9dd7a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d4a066eb87389675076b1a7a7cc2f004 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-887
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D5-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C48-92
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C48-92
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-16 |
| filingDate |
2011-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef8c14d2e01fb5e3be01d249ffe4d510
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d24e6c27ae54068c817dc11171f8f6b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_82779be5971909ffb78352f2ddf05ba7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc86d979001c8e26d773dd1a911e77ed
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca81b800555007900f1e4d3e2e944ded |
| publicationDate |
2013-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8562891-B2 |
| titleOfInvention |
Process and apparatus for ultraviolet nano-imprint lithography |
| abstract |
A process and an apparatus for performing a UV nano-imprint lithography are provided. The process uses a polymer pad which allows a uniform application of pressure to a patterned template and an easy removal of a residual resin layer. The apparatus includes a tilt and decentering corrector which allows an accurate alignment of layers during the nano-imprint lithography process. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9186700-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10451983-B2 |
| priorityDate |
2007-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |