Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_515b10ebcfe82a718b21c408ace219a8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b19eaa8e535da4e4bceed99917a68153 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_30dbaf776a285928934608bee9267a8c |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L2203-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-60 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L77-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D177-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-085 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0751 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K13-02 |
filingDate |
2009-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2013-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea2d9df8180afcbf709457ae10a6e162 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ffa676de6810369f5c56711d4df41476 |
publicationDate |
2013-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-8492469-B2 |
titleOfInvention |
Positive-type photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device and display device including the cured film |
abstract |
A positive-type photosensitive resin composition includes (A) an alkali-soluble resin, (B) a photosensitizer, and (C) a silicon compound shown by the following general formula (1).n n(R 2 O) 3 —Si—R 1 —Si—(OR 2 ) 3 (1)n nwherein R 1 represents an alkylene group having 5 to 30 carbon atoms or an organic group that includes at least one aromatic ring, and R 2 represents an alkyl group having 1 to 10 carbon atoms. The positive-type photosensitive resin composition exhibits excellent storage stability, produces a film that exhibits excellent adhesion to a substrate during development, and produces a cured film that exhibits excellent adhesion to a substrate after humidification. |
priorityDate |
2008-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |