| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c3a2f00e72ba6e4c09b6da573427fbed
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6584755dd2118a3d83a889a594253cb8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_483d38ae6dbacf7b4e2c8e2060512f8b |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-00 |
| filingDate |
2010-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c7737d38f42df896a1671f3dea382d9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e811588a23e5a6c0b16f0622213869e |
| publicationDate |
2013-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8420170-B2 |
| titleOfInvention |
Methods of forming glass on a substrate |
| abstract |
Disclosed is a deposition process for forming a glass film. An embodiment comprising the steps of disposing a substrate in a chemical vapor deposition chamber and exposing the substrate surface to a SiO 2 precursor gas, a carrier gas, and optionally a dopant gas in the presence of ozone and exposing the reaction volume of the gases above the substrate surface to a high intensity light source. |
| priorityDate |
1996-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |