| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e4613464b809c54cfaff6a092a9362be
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2e197055b22a09c96c193de2a4eb5675
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_065a8357c2780d0ce5083ad83984c8d3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_51191ae48933bc9e784669daba7cf558
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_58ee12befdafb37ccb31c3d0390aa413
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02219
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31608
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3086
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3088 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate |
2008-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2012-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5aa19b2d6c3b5bdada3f1f2199881589
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e030e74be724fc9e4cc8e807e0b40cb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eb131ff639e90e0ec32fd4378c3cf9ca
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_16adbfda21f61cb4bf9f6ef04753253d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_baf7ec78501e71f858e854339397d1de |
| publicationDate |
2012-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8168375-B2 |
| titleOfInvention |
Patterning method |
| abstract |
Disclosed is a patterning method including: forming a first film on a substrate; forming a multi-layered film including a resist film on the first film; forming a patterned resist film having a preset pattern by patterning the resist film by photolithography; forming a silicon oxide film different from the first film on the patterned resist film and the first film by alternately supplying a first gas containing organic silicon and a second gas containing an activated oxygen species to the substrate; etching the silicon oxide film to thereby form a sidewall spacer on a sidewall of the patterned resist film; removing the patterned resist film; and processing the first film by using the sidewall spacer as a mask. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015270138-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8491804-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10748768-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10157742-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9583337-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011237082-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017194147-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010240217-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8383522-B2 |
| priorityDate |
2007-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |