| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_52e1e4a66579671489f0087f16de784f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b62a061db267544224c10495ee0cd640
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_604bcb86096183a412f80a66fead13f6 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F6-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F6-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2004-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2012-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_506cb5f5ddcf97e1df306de057832d78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee58ddc5832c57bd6637cc40d71c98b1 |
| publicationDate |
2012-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8119321-B2 |
| titleOfInvention |
Resist polymer solution and process for producing the same |
| abstract |
A resist polymer solution comprising a resist polymer containing a repeating unit decomposed by the action of an acid so as to be soluble in alkali and a repeating unit having a polar group, the resist polymer dissolved in a solvent for coating film formation, wherein the amount of impurities whose boiling point is not higher than that of the solvent for coating film formation is 1 mass % or less based on the resist polymer. Further, there is provided a process for producing a resist polymer solution, comprising the step (1) of redissolving a solid matter containing a resist polymer in a solvent for coating film formation (a) and/or a solvent (b) whose boiling point at atmospheric pressure is not higher than that of the solvent (a); and the impurity removing step (2) of distilling off the solvent (b) and/or any excess amount of solvent (a) in vacuum from the redissolution solution obtained in the step (1). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9213236-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11681222-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9500950-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10620534-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009202945-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8697343-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10082733-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11036133-B2 |
| priorityDate |
2003-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |