| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c3a2f00e72ba6e4c09b6da573427fbed |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24521
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T137-206 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67057
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67086
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-04 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B3-10 |
| filingDate |
2008-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2011-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_511413c04c6745d1298f4144b95c6469 |
| publicationDate |
2011-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7981221-B2 |
| titleOfInvention |
Rheological fluids for particle removal |
| abstract |
Methods and apparatus for cleaning a substrate (e.g., wafer) in the fabrication of semiconductor devices utilizing electrorheological (ER) and magnetorheological (MR) fluids to remove contaminant residual particles from the substrate surface are provided. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010229890-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011269919-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8828145-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011269920-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013000669-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013273816-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8608857-B2 |
| priorityDate |
2008-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |