http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7824844-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_730848fc69ca7afca2b3c3e10b6cfd92 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-30 |
| filingDate | 2007-01-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2010-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_89215d79ff78d8cef956b7264f6f159f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5ced57c38b4791fb39334d1d6aeceff2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56ee2c37be67a377d8a3af0a8b0b58d8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_12267ea004f3af50f905972ca9173ce7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9cfa284e07dda337bb27125e4456ad94 |
| publicationDate | 2010-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-7824844-B2 |
| titleOfInvention | Solvent mixtures for antireflective coating compositions for photoresists |
| abstract | The invention relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least one primary organic solvent and at least one secondary organic solvent selected from any of structures 1, 2 and 3, n nwhere, R 1 , R 3 , and R 4 , are selected from H and C 1 -C 6 alkyl, and R 2 , R 5 , R 6 , R 7 , R 8 , and R 9 are selected from C 1 -C 6 alkyl, and n=1-5. The invention also relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least 2 organic solvents, and where the antireflective coating composition has a liquid particle count at 0.2 micron of less than 100/ml after accelerated aging. |
| priorityDate | 2007-01-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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