| abstract |
The invention relates to an antireflective coating composition for a photoresist layer comprising a polymer, a crosslinking agent and an acid generator, where the polymer comprises at least one unit of structure 1, n n n n n n n n n n where, A is a nonaromatic linking moiety,n R′ and R″ are independently selected from hydrogen, Z and W—OH, where Z is a (C 1 -C 20 ) hydrocarbyl moiety and W is a (C 1 -C 20 ) hydrocarbyl linking moiety, and, Y′ is independently a (C 1 -C 20 ) hydrocarbyl linking moiety. nn The invention further relates to a process for imaging the antireflective coating composition. |