http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7771894-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31616 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-30 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-80 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 |
| filingDate | 2006-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2010-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd30986b9329d9030c95dea96687e49b |
| publicationDate | 2010-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-7771894-B2 |
| titleOfInvention | Photomask having self-masking layer and methods of etching same |
| abstract | A photomask structure and method of etching is provided herein. In one embodiment, a photomask includes a translucent substrate and an opaque multi-layer absorber layer disposed over the substrate. The opaque multi-layer absorber layer comprises a self-mask layer disposed over a bulk absorber layer. The self-mask layer comprises one of nitrogenized tantalum and silicon-based materials (TaSiON), tantalum boron oxide-based materials (TaBO), or oxidized and nitrogenized tantalum-based materials (TaON). The bulk absorber layer comprises on of tantalum silicide-based materials (TaSi), nitrogenized tantalum boride-based materials (TaBN), or tantalum nitride-based materials (TaN). The self-mask layer has a low etch rate during the bulk absorber layer etch step, thereby acting as a hard mask. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9431040-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8871102-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9034564-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11226549-B2 |
| priorityDate | 2006-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 59.