| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_71b00fc8a4d3c3ada4612da97229c1cf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_224f9987225bc1791ad3f1111d03c7c6 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-77
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-428
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-402
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-401
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-2991 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-6455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3414
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-14 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B22F3-15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B22F5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B1-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 |
| filingDate |
2005-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2010-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f1aadb6b0913aa177e75991c689bc01e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3de3bf43446359284738b1131925c89f |
| publicationDate |
2010-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7749406-B2 |
| titleOfInvention |
SiOx:Si sputtering targets and method of making and using such targets |
| abstract |
Silicon oxide and electrically conductive doped silicon materials are joined in a protective environment to yield a composite SiO x :Si material that exhibits the properties of SiO x , and yet is electrically conductive due to the presence of the Si. Such a composite material finds use as a target for DC and/or AC sputtering processes to produce silicon oxide thin films for touch-screen applications, barrier thin films in LCD displays and optical thin films used in a wide variety of applications. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007131536-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8435388-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010219064-A1 |
| priorityDate |
2005-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |